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why Sulfur Hexafluoride vacuum Processing Method

why Sulfur Hexafluoride vacuum Processing Method

When feature widths were far greater than about 10 micrometres, semiconductor purity was not as big of an issue as it is today in device manufacturing.As devices become more integrated, cleanrooms must become even cleaner. Today, fabrication plants are pressurized with filtered air to remove even the smallest particles, which could come to rest on the wafers and contribute to defects.

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